Superior Industries’ eVerest RF energy generator gives multilevel energy pulsing and high-speed response for sub-2 nm semiconductor nodes. Built-in into any current plasma energy supply system, eVerest offers output energy from 3.5 kW to 10 kW and frequencies from 1 MHz to 60 MHz, in addition to large pulsing frequency as much as 100 kHz.
The unit’s high-speed setpoint response, managed overshoot between transition states, and entry to the PowerInsight information acquisition and evaluation platform enable producers to develop superior, repeatable processes for sub-2 nm deposition and etch profiles. Dynamic management of multilevel pulsing allows instantaneous or user-defined transition timing. Setpoint change rise/fall instances are <200 µs, with pulsing rise/fall instances of <2 µs. Additional, programmable overshoot ensures dependable ignition, in addition to the power to reestablish plasma in processes with longer pulse-off states.
“The semiconductor business’s mission to ship improved efficiency from ever-smaller chips is now taking us into the Angstrom Period, the place more and more complicated 3D buildings and progressive processes have dimensions measured on the atomic scale,” stated Juergen Braun, senior vp of plasma energy merchandise at Superior Power. “Superior Power has been on the forefront of plasma energy supply and management techniques for semiconductor processes for over forty years. This management continues with improvements that deal with the calls for from producers of Angstrom Period gadgets for transformational, high-precision plasma management that will increase course of window and widens steady working envelope to maximise throughput and yield.”
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