KemLab Inc., a pioneering developer of superior supplies for microelectronics and MEMS purposes, introduces the patent pending APOL-LO 3200 Sequence resist, a groundbreaking development in unfavourable tone photoresist expertise designed for i-Line and broadband purposes. The APOL-LO 3200 Sequence provides improved decision, broader course of latitude and unparalleled customization capabilities, elevating semiconductor manufacturing to unprecedented heights.
Picture Credit score: KemLab Inc.
Constructed to exceed trade requirements, this high-resolution resist introduces a lift-off profile that redefines the chances in i-Line and broadband purposes. This unlocks a number of advantages, together with improved decision, wider course of latitude, and a flexible movie thickness vary of two – 10+ μm.
KemLab’s dedication to pushing the boundaries of innovation is obvious within the APOL-LO 3200 Sequence resist. Trade professionals can now profit from customization choices that permit them to tailor the resist’s efficiency to fulfill their distinctive necessities. This consists of the flexibility to regulate the lift-off angle and PhotoSpeed, offering unmatched flexibility and management.
The APOL-LO 3200 Sequence resist is poised to rival main trade options, together with AZ® nLOFâ„¢ 2020, AZ® nLOFâ„¢ 2035, and AZ® nLOFâ„¢ 2070. With its distinctive options and efficiency, KemLab’s APOL-LO 3200 Sequence resist is positioned to raise semiconductor manufacturing to new ranges of effectivity and precision.
To cater to varied wants, KemLab provides the APOL-LO 3200 Sequence resist in a variety of sizes, together with 100 ml pattern, 500 ml, 1 L, and 4 L volumes. For industries requiring particular thicknesses and formulations, KemLab extends the choice for customized formulations, making certain that every answer is tailor-made to fulfill the distinctive calls for of the manufacturing course of.
Supply:Â https://www.kemlab.com/
